# Electron-beam lithography with character projection technique for high-throughput exposure with line-edge quality control

> Research article (Journal of Micro/Nanolithography MEMS and MOEMS, 2016) · cited 10× · AI/ML

**Wikidata**: [openalex:W2517390358](https://www.wikidata.org/wiki/openalex:W2517390358)  
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