# Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison

> Research article (Extreme Ultraviolet (EUV) Lithography IX, 2018) · cited 10× · AI/ML

**Wikidata**: [openalex:W2792960059](https://www.wikidata.org/wiki/openalex:W2792960059)  
**Source**: https://4ort.xyz/entity/double-patterning-at-na-0-33-versus-high-na-single-exposure-in-euv-lithography-an-imaging-comparison