# Compensation of EUV lithography mask blank defect based on an advanced genetic algorithm

> Research article (Optics Express, 2021) · cited 25× · AI/ML

**Wikidata**: [openalex:W3196043331](https://www.wikidata.org/wiki/openalex:W3196043331)  
**Source**: https://4ort.xyz/entity/compensation-of-euv-lithography-mask-blank-defect-based-on-an-advanced-genetic-algorithm