# Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth

> Research article (Current Applied Physics, 2019) · cited 11× · AI/ML

**Wikidata**: [openalex:W2949954666](https://www.wikidata.org/wiki/openalex:W2949954666)  
**Source**: https://4ort.xyz/entity/characteristics-of-a-plasma-information-variable-in-phenomenology-based-statistically-tuned-virtual-metrology-to-predict