# Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

> Research article (Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, 2016) · cited 19× · AI/ML

**Wikidata**: [openalex:W2306602571](https://www.wikidata.org/wiki/openalex:W2306602571)  
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